Minutes, IBIS Quality Committee

03 August 2010

11-12 AM EST (8-9 AM PST)

ROLL CALL
  Adam Tambone
  Anders Ekholm, Ericsson
  Barry Katz, SiSoft
  Benny Lazer
  Benjamin P Silva
  Bob Cox, Micron
* Bob Ross, Teraspeed Consulting Group
  Brian Arsenault
  David Banas, Xilinx
* Eckhard Lenski, Nokia Siemens Networks
  Eric Brock
  Guan Tao, Huawei Technologies
  Gregory R Edlund
  Hazem Hegazy
  Huang Chunxing, Huawei Technologies
  John Figueroa
  John Angulo, Mentor Graphics
  Katja Koller, Nokia Siemens Networks
  Kevin Fisher
  Kim Helliwell, LSI Logic
  Lance Wang, IOMethodology
  Lijun, Huawei
  Lynne Green, Green Streak Programs
* Mike LaBonte, Cisco Systems
  Mike Mayer, SiSoft
* Moshiul Haque, Micron Technology
  Muniswarareddy Vorugu, ARM Ltd
  Pavani Jella, TI
  Peter LaFlamme
  Randy Wolff, Micron Technology
  Radovan Vuletic, Qimonda
  Robert Haller, Enterasys
  Roy Leventhal, Leventhal Design & Communications
  Sherif Hammad, Mentor Graphics
  Tim Coyle, Signal Consulting Group
  Todd Westerhoff, SiSoft
  Tom Dagostino, Teraspeed Consulting Group
  Kazuyoshi Shoji, Hitachi
  Sadahiro Nonoyama

Everyone in attendance marked by *

NOTE: "AR" = Action Required.

-----------------------MINUTES ---------------------------
Mike LaBonte conducted the meeting.

Call for opens and IBIS related patent disclosures:

- No one declared a patent.

AR Review:

- Moshiul and Mike meet to review the correlation spec outline
  - Done

New items:

Mike showed the updated Correlation outline:
- The Measurement section has been removed completely
  - It's elements will be discussed under Data to Correlate
- Mike: FSV description might be lifted from IEEE
- Bob: Overlay and envelope might be lifted from the Accuracy Handbook
- Mike: This will be posted to our work archive
- Mike added "Production board samples" to the test fixtures
- Moshiul: Would this always be done?
- Bob: We can mention it as an existing practice by some
- Mike: It's daunting because there are many parts that can go wrong
  - The interconnect extraction could be the weak link
- Bob: Randy mentioned that scaling could help
  - The process corner would be an unknown, so only the envelope can be
    checked
  - Both the I/V and V/T would have to be scaled
- Moshiul: Ideally you would find the exact process corner
- Bob: The silicon model would be adjusted to match the measured results

Mike showed Randy Wolff's Nov 2008 presentation
- Slides 6 & 7 show I-V curves before and after PVT adjustment
  - P & N sides scaled separately
- Bob: Many approaches are used, we can only describe some

Mike: We might want to introduce the correlation metric types before
  discussing "Data to correlate" in the outline
  - The details could be covered later
- Bob: Just presenting a picture might be adequate
- Mike added "Visual" to the "Types of correlation metrics" list

Mike: Antonio Orlandi solved the problem using our data with FSV1D
- Our data has a duplicate data point at the end
- With that removed it works OK
- We can look at it next time

Next meeting will be August 17

Meeting ended at 12:14 PM Eastern Time.